Method to obtain nonuniformity information from field emission behavior

Copyright © 2010 American Vacuum Society / American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Journal of Vacuum Science and Technology Part B: Microelectronics and Nanometer Structures, 28(3), Article number 441 and may be found at http://scitation.aip.org/content/avs/journal/jvstb/28/3/10.1116/1.3327928.This article describes the characterization of field emission from a planar cathode to a spherical anode with the approach curve method (ACM). In such a diode configuration the electric field strength at the cathode surface is nonuniform. This nonuniformity gives an extra degree of freedom and it allows the interpretation of the current-voltage and voltage-distance (V×d) curves in terms of nonuniformity. The authors apply the ACM to Cu emitters to explain the nonlinearity of the V×d curve in ACM measurements. This analysis provides a good insight into field emission phenomena, supporting a method for nonuniformity characterization based on field emission behavior

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